CLEANROOM EQUIPMENT

1. UV Exposure station / Mask Aligner
   Model: OAI 2004-077148
   Function: Used to place patterns on Substrates
   Specs: UV exposure power output of 500W; single wafer capability, alignment controls, and mask holder for 5" x 5" masks
   
2. Photoresist Spin Coater
   Model: Bidtec SP100
   Function: Used to deposit photoresist on samples
   Specs: Digital programmability with maximum spinning speed of 6000 rpm; can hold 4" or 5" wafers
   
3. Low Temperature Convection Oven
   Model: Blue M POM7-256C
   Function: Used to dry samples
   Specs: Digital temperature readout with temperature capability of 300^oC
   
4. High Temperature Convection Oven
   Model: Gruenberg
   Function: Used to dry samples
   Specs: Digital programmable controller with temperature capability of 593^oC
   
5. RF and DC Sputtering System
   Model: CVC 601
   Function: Used to deposit metal or ceramic materials on samples
   Specs: Minimum vacuum levels 10^-5 Torr; 8" target option, with substrate/target temperature control, automatic valve control, process timer, 13.56 MHz RF power supply
   
6. Film Thickness Ellipsometer / Profiler
   Model: Gaertner L115B
   Function: Used to measure step heights and film thicknesses
   Specs: Measures thickness from 0 to 60,000 Angstroms, with error of 5 Angstroms; interfaces with computer to provide profile definition and data storage
   
7. Wet Bench / Fume Hood
   Model: N/A
   Function: Used for chemical processing of samples
   Specs: N/A

This lab is currently open for adoption via the Adopt-A-Lab Program. Please contact the Dean of the College of Engineering for details.